CAREER SUMMARY
I have extensive experience in the areas of Microelectromechanical Systems (MEMS) design and micro-fabrication, including process development in the area of deposition, etching and characterization of thin film materials.
• Plasma and Reactive Ion Etch (RIE), Wet Etch,
• Micro and Nano-Fabrication
• Microfluidics
• Design in AutoCAD and dw-2000
• Lithography
• Chemical Vapor Deposition (CVD. PECVD, APCVD)
• Wafer Bonding, Anodic, Thermo-Compression, Adhesive
PROFESSIONAL EXPERIENCE
Zeiss X-ray Microscopy (Pleasanton, CA) November 2013 - Present
Optics Consultant
Supporting manufacturing yield improvements for x-ray optical components including Zone Plates, Phase Rings, Beam Stops and Resolution Targets. Present work includes Reactive Ion Etch development for nano-scale titanium hard masks.
NanoInk (Campbell, CA) August 2002 - February 2013
Principal MEMS Engineer
Conception, design, fabrication and production support for pens and microfluidic ink delivery systems for Dip Pen Nanolithography (DPN). My work included photomask design (dw-2000 and AutoCAD); process development including lithography, wet and dry etch, wafer bonding and surface modification. I am sole and co-inventor on numerous patents relating to Dip Pen Nanolithography.
• Introduced NanoInk's first consumable product, Passive Pens for Dip Pen Nanolithography (DPN), from design to finished product completed in 4 months.
• Designed, fabricated and refined NanoInk's Thermally Actuated Pen product.
• Developed the 55,000 Pen 2-D Array product for DPN.
• Designed and fabricated Electrostatically Actuated Pens for DPN (patent issued).
• Developed several successful pen designs incorporating integrated ink delivery for DPN.
• Developed Process for producing Super-Hydrophobic Surfaces.
• Designed numerous Micro-Fluidic Ink Delivery systems.
• Developed RIE Process for producing nanometer scale features.
• Developed RIE Processes for silicon nitride and silicon dioxide.
• Developed Isotropic Plasma Etch for silicon nitride.
TM Microscopes - Division of Veeco Metrology (Sunnyvale, CA) 2000 - 2002 Micromachine Fabrication Manager
Responsible for development and production of micro-machined silicon probes for scanning probe microscopy.
• Specific accomplishments include development of fabrication processes for silicon and silicon nitride probes for atomic force microscopy.
Endevco (Sunnyvale, CA) 1998 - 2000
Senior Project Engineer
Responsible for design of micro-machined silicon sensors, process development, and manufacturing issues.
Specific projects included:
• Development of Deep Reactive Ion Etch process for silicon, RIE of silicon dioxide, redesign of existing pressure sensor products.
• Design and Finite Element Modeling of new sensor products.
• Integration of onboard balancing resistors to existing pressure sensor product.
• Documentation of manufacturing processes.
• Sustaining of wafer saw, ultrasonic cutting and plasma etch operations.
Stanford University, Gravity Probe B Project (GP-B) and Satellite Test of the Equivalence
Principle (STEP) Project (Stanford, CA) 1992 - 1998 Research and Development Engineer
Ran a major facility for the development and production of superconducting devices for cryogenic gyroscopes used in NASA funded satellite experiments. The GP-B experiment was completed successfully, confirming the existence of both frame-dragging and the geodetic effect predicted by Einstein's General Theory of Relativity.
• Developed lithographic process for patterning niobium on non-planer surfaces.
• Developed Thin-Film Superconducting Transformers used in the GP-B space mission.
• Developed first Thin-Film Superconducting Heat Switch.
• Developed RIE processes for etching niobium, silicon dioxide and silicon oxynitride
Kevex Instruments (Foster City and San Carlos, CA) 1987 - 1992
Process Engineer: Thin Film Window Development and Production
Responsible for all phases of development and production of micromachined thin film x-ray windows:
• Defined, set up and maintained entire cleanroom/lab and supporting facilities.
• Directed and supervised all aspects of project management, which included planning, scheduling, specifications, procurement, designing and testing.
• Supervised and trained 2 technicians and 1 engineer in the front-end process of the cleanroom, as well as the assembly and testing operations.
• Developed new applications for thin-film x-ray and electron windows, which resulted in a substantial increase in sales for Kevex
• Developed a remote-plasma etch process and hardware which resulted in a measurable improvement in uniformity, surface topography and sidewall profile control, development of new x-ray window designs with improved strength, reliability and enhanced x-ray transmission.
• Defined and implemented low pressure CVD process.
• Implemented photomask designs in AutoCAD.
• Set up and implemented the photo masking process.
• Developed and implemented endpoint control of the remote-plasma etch process.
• Set up and executed e-beam evaporation (nickel and aluminum) process.
• Designed and built instrumentation and associated software for measuring film stress.
Other positions included Process Devel...
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